Monitoring the process mean under the Bayesian approach with application to hard bake process.

This study introduces the Bayesian adaptive exponentially weighted moving average (AEWMA) control chart within the framework of measurement error, examining two separate loss functions: the squared error loss function and the linex loss function. We conduct an analysis of the posterior and posterior predictive distributions utilizing a conjugate prior. In the presence of measurement error (ME), we employ a linear covariate model to assess the control chart's effectiveness. Additionally, we explore the impacts of measurement error by investigating multiple measurements and a method involving linearly increasing variance. We conduct a Monte Carlo simulation study to assess the control chart's performance under ME, examining its run length profile. Subsequently, we offer a specific numerical instance related to the hard-bake process in semiconductor manufacturing, serving to verify the functionality and practical application of the suggested Bayesian AEWMA control chart when confronted with ME.